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Continuous monitoring for trace amounts of silica in high purity water, boiler feed water, demineralization plant and semiconductor process ultrapure water. Continuous high stability measurement. Repeatability ±0.5 ppb or ±2%. Wall or panel mounted. Stable reagents need renewing only every 45 days. Wide set of outputs: Two programmable 'smart' analog; three contacts for concentration and system alarms; one bi-directional RS232.
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